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Abrasives for Electronics Finishing

Photo Acid Generators


3M™ PAG Anions are experimental non-PFOS photo-acid generator anions designed especially for use in semiconductor photoresists. When combined with various cations, these anions offer high acid strength, excellent solubility in resins and solvents, high purity, high thermal stability and low volatility.



Photo Acid Generator Product Families

Photo Acid GeneratorsIn principle, any photo-active cation may be combined with any 3M anion. A variety of experimental 3M PAG anions are available to meet your specific requirements. Please contact 3M at 800-810-8513 or email fluids@mmm.com for the latest information.